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氧化锌 ZnO 晶体 wafer

25.4mm 50.8mm 76.5mm 100mm

intrinsic

<0001> <11-20> <10-10>

Hexagonal

1 - 9 *E10 ohm-cm

N/A 16mm 22.5mm 32.5mm

polished/etched polished/polished

TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um

氧化镁 MgO 晶体wafer

25.4mm 50.8mm 76.5mm 100mm

intrinsic

X Y Z cut

Tetragonal

0.9 - 9 *E11 ohm-cm

N/A 16mm 22.5mm 32.5mm

polished/etched polished/polished

TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um

氧化锆 MgO 晶体 wafer

25.4mm 50.8mm 76.5mm 100mm

intrinsic

X Y Z cut

Tetragonal

0.9 - 9 *E11 ohm-cm

N/A 16mm 22.5mm 32.5mm

polished/etched polished/polished

TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um

二氧化碲TeO2

25.4mm 50.8mm 76.5mm 100mm

intrinsic

X Y Z cut

Tetragonal

0.9 - 9 *E11 ohm-cm

N/A 16mm 22.5mm 32.5mm

polished/etched polished/polished

TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um

氧化镁MgO 氧化锆ZrO 氧化锌ZnO 二氧化碲TeO2 Wafer


Grade（等级）	Dimeter（直径）	Type/dopant（类型/掺杂）	Orientaion	crystal struction	Resistivity（电阻率）	Flat	Surface/Roughness（表面粗糙度）	Geometric parameter
氧化锌 ZnO 晶体 wafer	25.4mm 50.8mm 76.5mm 100mm	intrinsic	<0001> <11-20> <10-10>	Hexagonal	1 - 9 *E10 ohm-cm	N/A 16mm 22.5mm 32.5mm	polished/etched polished/polished	TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um
氧化镁 MgO 晶体wafer	25.4mm 50.8mm 76.5mm 100mm	intrinsic	X Y Z cut	Tetragonal	0.9 - 9 *E11 ohm-cm	N/A 16mm 22.5mm 32.5mm	polished/etched polished/polished	TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um
氧化锆 MgO 晶体 wafer	25.4mm 50.8mm 76.5mm 100mm	intrinsic	X Y Z cut	Tetragonal	0.9 - 9 *E11 ohm-cm	N/A 16mm 22.5mm 32.5mm	polished/etched polished/polished	TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um
二氧化碲TeO2	25.4mm 50.8mm 76.5mm 100mm	intrinsic	X Y Z cut	Tetragonal	0.9 - 9 *E11 ohm-cm	N/A 16mm 22.5mm 32.5mm	polished/etched polished/polished	TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um